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These images appear in the article "Ultrafast and direct
imprint of nanostructures in silicon," published in the June
20, 2002 issue of Nature (Vol. 417, pp.835-7) by Stephen
Chou et al. For a news release on the article see:
http://www.princeton.edu/pr/news/02/q2/0619-ladi.htm
Figure 1: This series of images shows the process by
which the researchers imprinted the pattern in a piece of
quartz into silicon (Si). The abbreviation ns stands for
nanosecond, a billionth of a second. The graph shows the
melting and solidification of the silicon; the silicon
becomes more reflective when it melts.
Figure 3: Image A shows a quartz template used to press
ultrasmall patterns into silicon. Image B shows the pattern
as it appears in silicon. The measurements are in
nanometers, billionths of a meter.
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