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These images appear in the article "Ultrafast and direct imprint of nanostructures in silicon," published in the June 20, 2002 issue of Nature (Vol. 417, pp.835-7) by Stephen Chou et al. For a news release on the article see:

Figure 1:
This series of images shows the process by which the researchers imprinted the pattern in a piece of quartz into silicon (Si). The abbreviation ns stands for nanosecond, a billionth of a second. The graph shows the melting and solidification of the silicon; the silicon becomes more reflective when it melts.

Figure 3:
Image A shows a quartz template used to press ultrasmall patterns into silicon. Image B shows the pattern as it appears in silicon. The measurements are in nanometers, billionths of a meter.

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